首页> 外国专利> Embedded PMOS-Trigger Silicon Controlled Rectifier (SCR) with Suppression Rings for Electro-Static-Discharge (ESD) Protection

Embedded PMOS-Trigger Silicon Controlled Rectifier (SCR) with Suppression Rings for Electro-Static-Discharge (ESD) Protection

机译:具有抑制环的嵌入式PMOS触发硅可控整流器(SCR),用于静电放电(ESD)保护

摘要

An Electro-Static-Discharge (ESD) protection device has a Silicon-Controlled Rectifier (SCR) with a triggering PMOS transistor. The SCR is a PNPN structure with a P+ anode/source within a center N-well, a P-substrate, and an outer N-well that connects to a cathode using N+ well taps. The P+ anode/source is both the source of the triggering PMOS transistor and the anode of the SCR. A trigger circuit drives the gate of the triggering PMOS transistor low, turning it on to charge the P+ drain. Since the P+ drain straddles the well boundary, making physical contact with both the center N-well and the P-substrate, holes flow into the P-substrate. The P+ drain is located near guard rings that suppress latch-up. The holes from the P+ drain flood the region under the guard rings, temporarily weakening their effect and reducing the trigger voltage.
机译:静电放电(ESD)保护设备具有带触发PMOS晶体管的可控硅整流器(SCR)。 SCR是PNPN结构,在中心N阱,P衬底和外部N阱中具有P +阳极/源极,外部N阱使用N +阱抽头连接到阴极。 P +阳极/源极既是触发PMOS晶体管的源极,也是SCR的阳极。触发电路将触发PMOS晶体管的栅极驱动为低电平,使其导通以对P +漏极充电。由于P +漏极跨越阱边界,与中心N阱和P衬底都发生物理接触,因此空穴流入P衬底。 P +漏极位于抑制闭锁的保护环附近。 P +漏极上的空穴淹没了保护环下方的区域,从而暂时削弱了其影响并降低了触发电压。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号