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Integrated circuit implementing standard cells with metal layer segments extending out of cell boundary

机译:使用金属层段延伸超出单元边界的标准单元的集成电路

摘要

A computer-implemented method of fabricating an integrated circuit structure includes selecting a first cell from a standard cell library, the first cell having a cell boundary and comprising a metal segment at a first metal track at a metal layer, the metal segment extending along a direction and terminating a specified distance beyond a first edge of the cell boundary. The method further includes placing the first cell at a first location of a physical layout for the integrated circuit structure. The method also includes selecting a second cell from the standard cell library and placing the second cell at a second location of the physical layout such that a second edge of a cell boundary of the second cell abuts the first edge of the cell boundary of the first cell, and wherein the metal segment extends into a metal track at the metal layer of the second cell.
机译:一种由计算机实现的制造集成电路结构的方法,包括从标准单元库中选择第一单元,该第一单元具有单元边界,并且在金属层的第一金属迹线处包括金属段,该金属段沿着金属层延伸。方向并终止超出单元边界第一边缘的指定距离。该方法还包括将第一单元放置在用于集成电路结构的物理布局的第一位置。该方法还包括从标准单元库中选择第二单元,并将第二单元放置在物理布局的第二位置,以使第二单元的单元边界的第二边缘邻接第一单元的单元边界的第一边缘。电池,其中金属段延伸到第二电池的金属层处的金属轨道中。

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