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Integrated High Side Gate Driver Structure and Circuit for Driving High Side Power Transistors

机译:集成的高端栅极驱动器结构和电路,用于驱动高端功率晶体管

摘要

An integrated high side gate driver structure for driving a power transistor. The structure includes a semiconductor substrate having a first polarity semiconductor material in which a first well diffusion including a second polarity semiconductor material is formed, An outer wall of the first well diffusion is abutted to the substrate. A second well diffusion, having first polarity semiconductor material, is arranged inside the first well diffusion such that an outer wall of the second well diffusion abuts an inner wall of the first well diffusion. The structure includes a gate driver having high side positive and negative supply voltage ports, and a driver input and output. The gate driver includes a transistor driver in the second well diffusion such that control and output terminals of the transistor driver are coupled to the driver input and output, respectively. The structure also includes respective electrical connections between the first and second well diffusions and the negative supply voltage port.
机译:用于驱动功率晶体管的集成的高端栅极驱动器结构。该结构包括具有第一极性半导体材料的半导体衬底,其中形成有包括第二极性半导体材料的第一阱扩散,该第一阱扩散的外壁邻接该衬底。具有第一极性半导体材料的第二阱扩散物被布置在第一阱扩散物的内部,使得第二阱扩散物的外壁邻接第一阱扩散物的内壁。该结构包括具有高端正负电源电压端口的栅极驱动器,以及驱动器输入和输出。栅极驱动器在第二阱扩散中包括晶体管驱动器,使得晶体管驱动器的控制和输出端子分别耦合到驱动器的输入和输出。该结构还包括第一阱扩散和第二阱扩散与负电源电压端口之间的相应电连接。

著录项

  • 公开/公告号US2018315849A1

    专利类型

  • 公开/公告日2018-11-01

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AUSTRIA AG;

    申请/专利号US201815981748

  • 发明设计人 ALLAN NOGUERAS NIELSEN;MIKKEL HØYERBY;

    申请日2018-05-16

  • 分类号H01L29/78;H01L21/8238;H01L27/06;H03F3/217;H03K17/687;H01L21/761;H01L29/10;

  • 国家 US

  • 入库时间 2022-08-21 12:58:07

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