; andan anion selected from the group consisting of BF4−, PF6−, (CF3SO2)2N−, a halide ion, a conjugate base of carboxylic acid, a conjugate base of sulfonic acid and a conjugate base of an inorganic acid."/>
Embedding resin composition for electron microscopey and method for observing sample with electron microscope using the same
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Embedding resin composition for electron microscopey and method for observing sample with electron microscope using the same
Embedding resin composition for electron microscopey and method for observing sample with electron microscope using the same
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机译:电子显微镜用包埋树脂组合物及使用该树脂组合物的电子显微镜观察方法
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摘要
The present invention provides an embedding resin composition for electron microscopy having satisfactory performance as an embedding medium, including embedding performance and sectioning quality, and exhibiting excellent antistatic performance; and a method for observing a sample with an electron microscope using the composition. The embedding resin composition for electron microscopy of the present invention having antistatic performance comprises an ionic liquid and an embedding medium comprising an epoxy-based resin, a methacrylate resin or an unsaturated polyester resin. Preferably, the ionic liquid comprisinga quaternary ammonium compound based on the formula (I):; andan anion selected from the group consisting of BF4−, PF6−, (CF3SO2)2N−, a halide ion, a conjugate base of carboxylic acid, a conjugate base of sulfonic acid and a conjugate base of an inorganic acid.展开▼