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Dielectric region in a bulk silicon substrate providing a high-Q passive resonator
Dielectric region in a bulk silicon substrate providing a high-Q passive resonator
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机译:体硅衬底中的介电区,提供高Q无源谐振器
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摘要
Structures and methods of making a dielectric region in a bulk silicon (Si) substrate of a mixed-signal integrated circuit (IC) provide a high-Q passive resonator. Deep trenches within the bulk Si substrate in 100 directions are expanded by wet etching to form contiguous cavities, which are filled by Si oxide to form a dielectric region. The dielectric region enhances the quality (Q) of an overlying passive resonator, formed in metallization layers of the mixed-signal IC.
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