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System and method for inhibiting VUV radiative emission of a laser-sustained plasma source

机译:抑制激光维持等离子体源的VUV辐射发射的系统和方法

摘要

A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture including a first gas component and a second gas component. The second gas component suppresses at least one of a portion of the broadband radiation associated with the first gas component or radiation by one or more excimers associated with the first gas component from a spectrum of radiation exiting the gas mixture.
机译:用于形成激光维持等离子体的系统,包括气体容纳元件,配置为产生泵浦照明的照明源以及配置为将泵浦照明从泵浦源聚焦到混合气体体积中的收集器组件,以产生气体。发射宽带辐射的气体混合物体积中的等离子。气体容纳元件可以构造成容纳一定体积的气体混合物,该气体混合物包括第一气体成分和第二气体成分。第二气体成分抑制与第一气体成分相关联的宽带辐射中的至少一部分,或者抑制一个或多个与第一气体成分相关联的受激准分子的辐射中的至少一个从离开气体混合物的辐射光谱中。

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