Method of manufacturing an infrared detector having a micro-cavity and a low refraction index step at an interface with a transparent cap, and associated infrared detector

摘要

A method of manufacturing a detector capable of detecting a wavelength range [λ₈; λ₁₄] centered on a wavelength λ₁₀, including: forming said device on a substrate by depositing a sacrificial layer totally embedding said device; forming, on the sacrificial layer, a cap including first, second, and third optical structures transparent in said range [Δ₈; λ₁₄], the second and third optical structures having equivalent refraction indexes at wavelength λ₁₀ respectively greater than or equal to 3.4 and smaller than or equal to 2.3; forming a vent of access to the sacrificial layer through a portion of the cap, and then applying, through the vent, an etching to totally remove the sacrificial layer.