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Chemical supply unit capable of automatically replacing a canister and a substrate treatment apparatus having the same

机译:能够自动更换罐的药液供给单元和具有该药液供给单元的基板处理装置

摘要

A substrate treatment apparatus includes a substrate treatment unit configured to provide a chemical solution to a substrate to treat the substrate, and a chemical supply unit configured to supply the chemical solution to the substrate treatment unit. The chemical supply unit includes a loader configured to load a canister containing the chemical solution to the chemical supply unit, a clamp configured to clamp the canister in place, a chemical supply line through which the chemical solution is supplied to the substrate treatment unit, and a coupler configured to couple the chemical supply line to the canister. The chemical supply unit is capable of automatically replacing the canister and the substrate.
机译:基板处理装置包括:基板处理单元,被配置为向基板提供化学溶液以处理基板;以及化学物质供应单元,被配置为向基板处理单元供应化学溶液。化学品供应单元包括配置为将包含化学溶液的罐加载到化学品供应单元的加载器,配置为将罐夹持在适当位置的夹具,化学品溶液通过该化学品供应线供应到基板处理单元,以及耦合器,其配置成将化学药品供应管线耦合到罐。化学药品供应单元能够自动更换碳罐和基材。

著录项

  • 公开/公告号US9989855B2

    专利类型

  • 公开/公告日2018-06-05

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号US201715401800

  • 发明设计人 DAI-HEE LEE;SUNGMIN JANG;SU-HWAN KIM;

    申请日2017-01-09

  • 分类号H01L21/027;B25J11/00;F17C13/08;G03F7/16;B67D7/84;H01L21/67;B67D7/02;B65D47/04;B67D1/08;

  • 国家 US

  • 入库时间 2022-08-21 12:55:37

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