首页> 外国专利> Interconnect substrate having cavity for stackable semiconductor assembly, manufacturing method thereof and vertically stacked semiconductor assembly using the same

Interconnect substrate having cavity for stackable semiconductor assembly, manufacturing method thereof and vertically stacked semiconductor assembly using the same

机译:具有用于可堆叠半导体组件的腔的互连基板,其制造方法以及使用该互连基板的垂直堆叠半导体组件

摘要

An interconnect substrate having vertical connection channels around a cavity is characterized in that contact pads are exposed from the cavity and the vertical connection channels are made of a combination of metal posts and metallized vias. The cavity includes a recess in a core layer and an aperture in a stiffener. The metal posts, disposed over the top surface of the core layer, are sealed in the stiffener and are electrically connected to a buildup circuitry adjacent to the bottom surface of the core layer. The minimal height of the metal posts needed for the vertical connection can be reduced by the amount equal to the depth of the recess. The buildup circuitry is electrically connected to the metal posts through the metallized vias and provides the contact pads exposed from the cavity for device connection.
机译:具有围绕空腔的垂直连接通道的互连基板,其特征在于,接触垫从空腔露出,并且垂直连接通道由金属柱和金属化通孔的组合制成。空腔包括在芯层中的凹口和在加强件中的孔。布置在芯层的顶表面上方的金属柱被密封在加强件中,并且电连接到与芯层的底表面相邻的堆积电路。垂直连接所需的金属柱的最小高度可以减小等于凹槽深度的量。积层电路通过金属化的通孔电连接到金属柱,并提供从空腔暴露出来的接触垫,用于器件连接。

著录项

  • 公开/公告号US9825009B2

    专利类型

  • 公开/公告日2017-11-21

    原文格式PDF

  • 申请/专利权人 BRIDGE SEMICONDUCTOR CORPORATION;

    申请/专利号US201615247443

  • 发明设计人 CHARLES W. C. LIN;CHIA-CHUNG WANG;

    申请日2016-08-25

  • 分类号H01L21/4763;H01L25/065;H01L23/498;H01L21/48;H01L23/538;H01L23/16;H01L23/31;H01L23;H01L25/10;H01L25;

  • 国家 US

  • 入库时间 2022-08-21 12:55:23

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