首页> 外国专利> Plasma source using a macro particle reduction coating and method of using Plasma source using a macro particle reduction coating for deposition of thin film coatings and surface modification

Plasma source using a macro particle reduction coating and method of using Plasma source using a macro particle reduction coating for deposition of thin film coatings and surface modification

机译:使用大颗粒减少涂层的等离子源和使用大颗粒减少涂层的等离子源用于薄膜涂层的沉积和表面改性的方法

摘要

The present invention relates generally to a plasma source utilizing a macroparticle reduction coating and method of using the plasma source utilizing macroparticle reduction for the deposition of thin film coatings and surface modification. more particularly, the present invention relates to a plasma source comprising one or more plasma generating electrodes, wherein a macroparticle reduction coating is deposited on at least a portion of the plasma generating surfaces of one or more more electrodes to protect the electrode plasma generation surfaces from erosion by the plasma produced and to resist particulate matter formation, thereby increasing performance and extending the life of the plasma source.
机译:本发明总体上涉及利用大颗粒还原涂层的等离子体源以及使用利用大颗粒还原涂层的等离子体源沉积薄膜涂层和表面改性的方法。更具体地,本发明涉及一种包括一个或多个等离子体产生电极的等离子体源,其中在一个或多个电极的等离子体产生表面的至少一部分上沉积大颗粒还原涂层以保护电极等离子体产生表面免受腐蚀。被产生的等离子体腐蚀并抵抗颗粒物质的形成,从而提高性能并延长等离子体源的寿命。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号