WINDING TYPE FILM DEPOSITION DEVICE EVAPORATION SOURCE UNIT AND WINDING TYPE FILM DEPOSITION METHOD

摘要

In order to suppress variations in thickness and transmittance in the width direction of a film a winding type film deposition device 1 pertaining to an embodiment of the present invention is provided with an unwinding roller 2 a winding roller 3 a cooling roller 4 an evaporation source array 6 and a gas supply part 7. The evaporation source array 6 has a plurality of first evaporation sources 61 (61A 61E) disposed at a predetermined interval on a first line L1 parallel to the axial direction of the cooling roller 4 and a plurality of second evaporation sources 62 (62A 62F) disposed at the abovementioned predetermined interval and offset by half the pitch of the plurality of first evaporation sources 61 on a second line L2 parallel to the first line L1. The gas supply part 7 has a plurality of first nozzle parts 71 (71A 71E) for jetting a gas toward a vapor flow from the plurality of first evaporation sources 61 and a plurality of second nozzle parts 72 (72A 72F) for jetting a gas toward a vapor flow from the plurality of second evaporation sources 62 and the gas supply part 7 is disposed between the evaporation source array 6 and the cooling roller 4.