首页> 外国专利> SIMULTANEOUS MULTI-ELEMENTS ANALYSIS TYPE X-RAY FLUORESCENCE SPECTROMETER, AND SIMULTANEOUS MULTI-ELEMENTS X-RAY FLUORESCENCE ANALYZING METHOD

SIMULTANEOUS MULTI-ELEMENTS ANALYSIS TYPE X-RAY FLUORESCENCE SPECTROMETER, AND SIMULTANEOUS MULTI-ELEMENTS X-RAY FLUORESCENCE ANALYZING METHOD

机译:同时多元素分析型X射线荧光光谱仪及同时多元素X射线荧光分析方法

摘要

This multi-element simultaneous X-ray fluorescence analysis device is provided with a sample base (2) on which a sample (1) is mounted, a conveyance arm (22) for the sample (1), a stage (11) for moving the sample base (2), and an X-ray source (8) for radiating primary X-rays (7), a notch part (2e) through which the conveyance arm (22) passes in the vertical direction being formed in the sample base (2), a background correction means (21) storing in advance as the background intensity of a measurement point (Pn) an intensity obtained by subtracting the measured intensity of a reference measurement point (P0) on the notch part (2e) from the measured intensity of the measurement point (Pn), for each measurement point (Pn) in a blank wafer (1b), and the background correction means (21) subtracting the background intensity of the measurement point (Pn) from the measured intensity of the measurement point (Pn) and performing correction, for each measurement point (Pn) in a sample (1a) to be analyzed.
机译:该多元素同时X射线荧光分析装置具有:样品台(2),其上安装有样品(1);用于样品(1)的输送臂(22);用于移动的台架(11)。在试样台(2)上形成有用于照射一次X射线(7)的X射线源(8),在该试样上形成有供输送臂(22)沿上下方向通过的切口部(2e)。以背景(2)为基础,背景校正装置(21)预先存储通过从凹口部分(2e)上减去基准测量点(P0)的测量强度而获得的强度作为测量点(Pn)的背景强度。对于空白晶片(1b)中的每个测量点(Pn),测量点(Pn)的测量强度,以及背景校正装置(21)从测量点的强度减去测量点(Pn)的背景强度对要测量的样本(1a)中的每个测量点(Pn)进行校正分析。

著录项

  • 公开/公告号WO2017154505A8

    专利类型

  • 公开/公告日2018-06-28

    原文格式PDF

  • 申请/专利权人 RIGAKU CORPORATION;

    申请/专利号WO2017JP05678

  • 发明设计人 FUJIMURA SEIJI;AOKI YU;

    申请日2017-02-16

  • 分类号G01N23/223;G01N23/207;

  • 国家 WO

  • 入库时间 2022-08-21 12:47:13

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