首页> 外国专利> MULTI-ELEMENT SIMULTANEOUS X-RAY FLUORESCENCE ANALYSIS DEVICE AND MULTI-ELEMENT SIMULTANEOUS X-RAY FLUORESCENCE ANALYSIS METHOD

MULTI-ELEMENT SIMULTANEOUS X-RAY FLUORESCENCE ANALYSIS DEVICE AND MULTI-ELEMENT SIMULTANEOUS X-RAY FLUORESCENCE ANALYSIS METHOD

机译:多元素同时x射线荧光分析装置和多元素同时x射线荧光分析方法

摘要

A simultaneous multi-elements analysis type X-ray fluorescence spectrometer according to the present invention includes: a sample table (2) on which a sample (1) is placed and a conveyance arm (22) for the sample (1). The sample table (2) has a cutout (2e) formed therein, through which the conveyance arm (22) is allowed to pass in a vertical direction. Regarding respective measurement points (Pn) on a blank wafer (1b), a background correction unit (21) previously stores, as background intensities at the measurement points (Pn), intensities obtained by subtracting a measured intensity at a reference measurement point (P0) located above the cutout (2e) from each of measured intensities at the measurement points (Pn), and regarding respective measurement points (Pn) on an analytical sample (1a), the background correction unit (21) subtracts the background intensities at the measurement points (Pn) from measured intensities at the measurement points (Pn), thereby correcting background.
机译:根据本发明的同时多元素分析型X射线荧光光谱仪包括:放置有样品(1)的样品台(2)和用于样品(1)的输送臂(22)。样品台(2)上形成有切口(2e),输送臂(22)沿垂直方向穿过该切口。关于空白晶片(1b)上的各个测量点(Pn),背景校正单元(21)预先存储通过减去基准测量点(P0)的测量强度而获得的强度作为测量点(Pn)的背景强度。 )位于测量点(Pn)上每个测量强度的切口(2e)上方,并且对于分析样本(1a)上的各个测量点(Pn),背景校正单元(21)减去根据测量点(Pn)处的测量强度来测量测量点(Pn),从而校正背景。

著录项

  • 公开/公告号EP3428630A4

    专利类型

  • 公开/公告日2019-12-04

    原文格式PDF

  • 申请/专利权人 RIGAKU CORPORATION;

    申请/专利号EP20170762848

  • 发明设计人 FUJIMURA SEIJI;AOKI YU;

    申请日2017-02-16

  • 分类号G01N23/223;G01N23/207;

  • 国家 EP

  • 入库时间 2022-08-21 11:39:43

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