METHOD FOR MICROLITHOGRAPHIC PRODUCTION OF MICROSTRUCTURED COMPONENTS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

The invention relates to a method for microlithographic production of microstructured components and a microlithographic projection exposure apparatus. In a method for microlithographic production of microstructured components, used structures situated on a mask and marker structures situated on the mask are illuminated with an illumination device and imaged onto a wafer provided with a photoresist using a projection lens, with production of corresponding marker structure images and used structure images. A method according to the invention has the following steps: ascertaining a plurality of offset values respectively assigned to different times, wherein each of these offset values characterizes an offset, produced by the projection lens at the relevant time, between a marker structure image and a used structure image, and positioning the used structure images in subsequent lithography steps relative to one another on the basis of these offset values.