首页> 外国专利> CONDUCTIVE FILM PRODUCTION METHOD, CONDUCTIVE FILM, TOUCH PANEL SENSOR, ANTENNA, FINGERPRINT AUTHENTICATION, AND TOUCH PANEL

CONDUCTIVE FILM PRODUCTION METHOD, CONDUCTIVE FILM, TOUCH PANEL SENSOR, ANTENNA, FINGERPRINT AUTHENTICATION, AND TOUCH PANEL

机译:导电膜生产方法,导电膜,触摸屏传感器,天线,指纹认证和触摸屏

摘要

The objective of the present invention is to provide a conductive film production method with which it is possible to form a thin metal wire in wire width of 2.0 μm or less. The objective of the present invention is to provide a conductive film, a touch panel sensor, an antenna, a fingerprint authentication unit, and a touch panel as well. This conductive film production method includes the steps of: forming a first metal film on a substrate; forming a composition layer for resist film formation on the first metal film; placing a mask on top of the composition layer for resist film formation in such a way that the distance between a mask having formed therein an opening of 1.5 μm or less in line width and the first metal film is 1.5 μm or less; exposing the composition layer for resist film formation to light by a parallel light exposure machine; obtaining a resist film in which an exposed area is removed and an opening is formed; forming a second metal film inside the opening of the resist film; removing the resist film; and removing a portion of the first metal film and forming a conductive part.
机译:本发明的目的在于提供一种导电膜的制造方法,利用该方法可以形成线宽为2.0μm以下的金属细线。本发明的目的是提供一种导电膜,触摸面板传感器,天线,指纹认证单元以及触摸面板。该导电膜的制造方法包括以下步骤:在基板上形成第一金属膜;以及在基板上形成第一金属膜。在第一金属膜上形成用于抗蚀剂膜形成的组成层;在用于抗蚀剂膜形成的组合物层的顶部上放置掩模,使得在其中形成的掩模的线宽为1.5μm以下的开口与第一金属膜之间的距离为1.5μm以下;通过平行曝光机将用于抗蚀剂膜形成的组合物层曝光。获得其中去除了暴露区域并形成开口的抗蚀剂膜;在抗蚀剂膜的开口内形成第二金属膜;去除抗蚀剂膜;去除第一金属膜的一部分并形成导电部分。

著录项

  • 公开/公告号WO2018047608A1

    专利类型

  • 公开/公告日2018-03-15

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORPORATION;

    申请/专利号WO2017JP29623

  • 发明设计人 ICHIKI TAKAHIKO;YOSHIDA MASAFUMI;

    申请日2017-08-18

  • 分类号G06F3/041;G06F3/044;H05K3/18;

  • 国家 WO

  • 入库时间 2022-08-21 12:45:04

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