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GRAPHENE NANORIBBON INTERCONNECTS AND INTERCONNECT LINERS

机译:GRAPHENE NANORIBBON互连线和互连线

摘要

Graphitic nanoribbon interconnects are described. The graphitic nanoribbon interconnects are fabricated by forming a graphitic layer (such as graphene) on a metal feature growth catalyst. The metal feature growth catalyst is selectively removed, leaving a graphitic nanoribbon remaining as the interconnect. Graphitic nanoribbon interconnects have a thickness of from 0.3 nanometers (nm) to 2 nm and a height of at least 40 nm. The conductive graphitic nanoribbon interconnect overcomes the need to include conventionally composed interconnect liners. Furthermore, the reduced feature size of the graphitic nanoribbon interconnect compared to conventional liners enables greater interconnect density and semiconductor device density.
机译:描述了石墨纳米带互连。通过在金属特征生长催化剂上形成石墨层(例如石墨烯)来制造石墨纳米带互连。金属特征生长催化剂被选择性地去除,剩下石墨纳米带作为互连。石墨纳米带互连的厚度为0.3纳米(nm)至2 nm,高度至少为40 nm。导电石墨纳米带互连克服了包括常规组成的互连衬里的需求。此外,与常规衬垫相比,石墨纳米带互连件的减小的特征尺寸能够实现更大的互连件密度和半导体器件密度。

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