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Adherend delamination apparatus of film for printed circuit board of dry type

机译:干式印刷电路板薄膜的附着剥离装置

摘要

The present invention relates to a dry foreign material removal apparatus for a substrate film, comprising: a film supply unit (10) which supplies a bundle of substrate films along a conveyor; a cutting unit (20) which makes cuts on the substrate bundle to be easily cut while the substrate bundle supplied through the film supply unit (10) is allowed to pass downwards; a first peeling unit (30) which peels foreign materials attached to the substrate films by surface friction between the substrate films; a second peeling unit (40) which peels and pulverizes the remaining foreign materials attached to the substrate films by surface friction between the substrate films; a pulverization unit (50) which pulverizes the substrate film supplied through the second peeling unit (40) to be smaller than a predetermined size by a pulverization blade (51); and a dust removal unit (60) which induces the substrate film pulverized in the pulverization unit (50) to the upper end portion thereof to be induced downwards in a whirl shape along the inner circumferential surface, supplies the substrate film to the subsequent process, and discharges dust lighter than the substrate film upwards through a dust collection pipe (61).
机译:基材膜的干燥异物去除装置技术领域本发明涉及一种基材膜的干燥异物去除装置,其包括:膜供给单元(10),其沿着输送机供给一束基材膜;和切割单元(20),其使得在通过膜供应单元(10)供应的衬底束向下通过的同时,容易切割衬底束上的切割;第一剥离单元(30),其通过基板膜之间的表面摩擦来剥离附着在基板膜上的异物。第二剥离单元(40),其通过基板膜之间的表面摩擦力将附着在基板膜上的残留的异物剥离并粉碎。粉碎单元(50),其通过粉碎刀片(51)将通过第二剥离单元(40)供给的基板膜粉碎成小于规定尺寸。除尘单元(60),其将在粉碎单元(50)中粉碎的基材膜沿其内周面以涡流状向下引导至其上端部,并向下旋转,从而将其提供给后续工艺,并通过集尘管(61)向上排放比基材膜轻的灰尘。

著录项

  • 公开/公告号KR20170126736A

    专利类型

  • 公开/公告日2017-11-20

    原文格式PDF

  • 申请/专利权人 C&J CO. LTD.;

    申请/专利号KR20160057178

  • 发明设计人 SO JAE SEUNG;

    申请日2016-05-10

  • 分类号B08B1/02;B08B5/02;H01L21/02;H01L21/67;H01L21/78;

  • 国家 KR

  • 入库时间 2022-08-21 12:41:58

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