首页> 外国专利> A photosensitive resin composition for a thin film transistor, a cured film, a thin film transistor, a liquid crystal display or an organic electroluminescence display, a method of manufacturing a cured film, a method of manufacturing a thin film transistor, and a manufacturing method of a liquid crystal display or an organic electroluminescence display

A photosensitive resin composition for a thin film transistor, a cured film, a thin film transistor, a liquid crystal display or an organic electroluminescence display, a method of manufacturing a cured film, a method of manufacturing a thin film transistor, and a manufacturing method of a liquid crystal display or an organic electroluminescence display

机译:用于薄膜晶体管的光敏树脂组合物,固化膜,薄膜晶体管,液晶显示器或有机电致发光显示器,固化膜的制造方法,薄膜晶体管的制造方法以及制造方法液晶显示器或有机电致发光显示器的

摘要

An object of the present invention is to provide a photosensitive resin composition for a thin film transistor capable of forming an insulating layer for a thin film transistor having very little outgas generated from a cured film and having excellent driving performance. In order to achieve the above object, the present invention has the following configuration. That is, the present invention provides a photosensitive resin composition for a thin film transistor comprising (A) an alkali-soluble resin having an amide group and / or an imide group, (B) a photosensitive compound, and (C) Is 1% by mass or less based on the total amount of the organic solvent.
机译:本发明的目的是提供一种用于薄膜晶体管的光敏树脂组合物,其能够形成用于薄膜晶体管的绝缘层,该绝缘层具有很少的由固化膜产生的废气并且具有优异的驱动性能。为了实现上述目的,本发明具有以下构造。即,本发明提供了一种用于薄膜晶体管的光敏树脂组合物,其包含(A)具有酰胺基和/或酰亚胺基的碱溶性树脂,(B)光敏化合物,并且(C)为1%相对于有机溶剂的总量为质量%以下。

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