Dielectric window supporting structure for inductively coupled plasma processing apparatus

摘要

The present invention relates to a plasma processing apparatus comprising a main body container 10 for receiving a target substrate S and performing plasma processing, a substrate mounting table 20 for mounting a target substrate S in the main body container 10, An exhaust system 30 for exhausting the inside of the main body container 10; a plurality of dielectric windows 100 constituting an upper window of the main body container 10; A dielectric support 400 for supporting the plurality of dielectric windows 100 to seal the inside of the vessel 10 and a dielectric support 400 installed corresponding to the dielectric window 100 outside the main vessel 10, An inductively coupled plasma processing apparatus comprising at least one RF antenna (40) for generating an inductive electric field in the main body container (10) by being supplied with RF power, wherein the dielectric supporting unit (400) An outer frame 410 supported at an upper end thereof, A support portion 402 for supporting the bottom edge of the dielectric window 100 is formed and an opening 401 corresponding to a plane shape of each dielectric window 100 is formed and a central frame The dielectric support structure of the inductively coupled plasma processing apparatus includes the dielectric window support structure. The dielectric support structure in the area where the antenna is installed can be replaced with a ceramic to minimize the power loss due to the support structure.