Dielectric window supporting structure for inductively coupled plasma processing apparatus

摘要

The present invention relates to a plasma processing apparatus comprising a main body container 10 for receiving a target substrate S and performing plasma processing, a substrate mounting table 20 for mounting a target substrate S in the main body container 10, An exhaust system 30 for exhausting the inside of the main body vessel 10, a dielectric window 100 constituting an upper window of the main body vessel 10, And at least one RF antenna (40) for forming an inductive electric field in the main body container (10) by being supplied with RF power, wherein the dielectric window (100) A dielectric window of an inductively coupled plasma processing apparatus in which a plurality of dielectric members 110 divided into a plurality of dielectric members 110 are bonded and integrated, thereby minimizing power loss due to the supporting structure by replacing a dielectric supporting structure in a region where the antenna is installed with a ceramicCan be.