ADVANCED PROCESS CONTROL METHOD FOR SEMICONDUCTOR PROCESS USING VIRTUAL METROLOGY

摘要

Disclosed is a pre-process control method for a semiconductor process using virtual measurement. According to the present invention, the pre-process control method for a semiconductor process using virtual measurement comprises: a step of performing measurement and setting an initial virtual measurement model while actually performing a process; a step of determining and performing a target process; a step of performing virtual measurement by using the initial virtual measurement model for the target process; a step of controlling a pre-process condition for the virtual measurement; and a step of performing the process in accordance with the pre-process condition control. According to the present invention, when an actual measurement value and a virtual measurement value are compared by actually performing a process by utilizing pre-process control using virtual measurement, the difference is insignificant and thus the virtual measurement value can be applied to the actual process. In addition, it is possible to perform measurement and process control within a short time at low cost by using the pre-process control using virtual measurement, and an initial model is updated by periodic updating of data accumulated over time, and the reliability can be improved over time.