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Source housing assembly for controlling ion beam extraction stability and ion beam current

机译:源壳体组件,用于控制离子束提取稳定性和离子束电流

摘要

Approaches for improving ion beam extraction stability and ion beam current for ion extraction systems are provided in the present application. In one approach, the source housing assembly may include a source housing surrounding an ion source including an arc chamber, and the source housing has an extraction aperture plate mounted at its proximal end. The source housing assembly further includes a vacuum liner disposed within the source housing to form a barrier around the set of vacuum pumping apertures. As configured, the holes in the source housing assembly in addition to the holes in the extraction aperture plate are encapsulated in the extraction aperture plate and the vacuum liner to ensure that the sub-arcs produced outside the arc chamber or externally generated ions remain within the source housing. Only ions of interest produced in the arc chamber pass through the aperture of the extraction aperture plate and exit the source housing.
机译:在本申请中提供了用于改善离子提取系统的离子束提取稳定性和离子束电流的方法。在一种方法中,源壳体组件可包括围绕离子源的源壳体,该离子源包括电弧室,并且该源壳体具有安装在其近端的提取孔板。源壳体组件还包括设置在源壳体内的真空衬套,以在该组真空泵孔周围形成屏障。按照配置,除提取孔板中的孔外,源壳体组件中的孔还封装在提取孔板和真空衬管中,以确保在电弧室外部产生的子弧或外部产生的离子保留在提取室内。源外壳。仅在电弧室中产生的感兴趣离子穿过提取孔板的孔并离开源壳体。

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