METHOD AND APPARATUS FOR FORMING LOW TEMPERATURE POLYSILICON THIN FILM ON FLEXIBLE SUBSTRATE USING ROLL-TO-ROLL SYSTEM

摘要

The present invention relates to a method and apparatus for forming a low temperature polysilicon thin film in a display manufacturing process. The entire process of forming a low temperature polysilicon thin film through the deposition and crystallization of a plurality of thin film layers and an amorphous silicon thin film on a flexible substrate is continuously performed in a batch process using a roll-to-roll system. It is possible to omit a dehydrogenation process through high temperature heat treatment, by using an ion beam deposition method when an amorphous silicon thin film is deposited. Accordingly, manufacturing costs can be reduced.;COPYRIGHT KIPO 2018