METHOD FOR MANUFACTURING PHOTOMASK LITHOGRAPHY APPARATUS METHOD OF MANUFACTURING DISPLAY DEVICE INSPECTION METHOD OF PHOTOMASK SUBSTRATE AND INSPECTION APPARATUS OF PHOTOMASK SUBSTRATE

摘要

The purpose of the present invention is to enable coordinate precision to be improved more efficiently in manufacturing of a photomask. A manufacturing method of a photomask, as a manufacturing method of a photomask having a transfer pattern based on design drawing data (W1) on a first circumferential surface of a transparent substrate, comprises: a process of mounting on a stage of a drawing apparatus a photomask substrate in which a thin film and a resist film are stacked on the first circumferential surface; a drawing process of performing a drawing operation on the photomask substrate; and a process of patterning the thin film by using a resist pattern formed by developing the resist film. The drawing process includes preparing drawing apparatus intrinsic data (M1) showing deformation amounts affecting shape of the photomask substrate by the drawing apparatus and rear surface data (S2) showing shape of a second circumferential surface of the photomask substrate; and draws the transfer pattern on the photomask substrate by applying coordinate displacement synthetic amounts (D1) caused by the drawing apparatus intrinsic data (M1) and the rear surface data (S2) to the design drawing data (W1).