Sb-Te SPUTTERING TARGET OF SINTERED SB-TE-BASED ALLOY

摘要

A sputtering target having an Sb content of 10 to 60 at%, a Te content of 20 to 60 at%, and the balance of at least one element selected from Ag, In and Ge and inevitable impurities, wherein the average particle diameter of the oxide is 0.5 m or less A Sb-Te based alloy sintered body sputtering target characterized by: It is an object of the present invention to improve the sputtering target structure of the Sb-Te based alloy sintered body, to prevent arcing at the time of sputtering, and to improve the thermal stability of the sputtering film.