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ENERGY-SENSITIVE COMPOSITION USED FOR FORMING PLANARIZATION FILM OR MICROLENS ON SUBSTRATE, METHOD OF PRODUCING CURED BODY, CURED BODY, METHOD OF PRODUCING MICROLENS, AND CMOS IMAGE SENSOR
ENERGY-SENSITIVE COMPOSITION USED FOR FORMING PLANARIZATION FILM OR MICROLENS ON SUBSTRATE, METHOD OF PRODUCING CURED BODY, CURED BODY, METHOD OF PRODUCING MICROLENS, AND CMOS IMAGE SENSOR
Provided are an energy-sensitive composition which has excellent low-temperature curability and is used for forming a planarization film or a microlens on a substrate, a method of producing a cured body, the cured body, a method of producing the microlens, and a CMOS image sensor. The energy-sensitive composition of the present invention, as the energy-sensitive composition for forming the planarization film or the microlens on the substrate, comprises a resin (A) and a thermal acid generator (B). The resin (A) has a structural unit (a1) derived from hydroxyl group-containing (meth)acrylic acid derivatives and an acid generating temperature of the thermal acid generator (B) observed in differential scanning calorie measurement is 100°C to 200°C. The energy-sensitive composition further comprises an acid crosslinking structure (C), the acid crosslinking structure (C) is a partial structure of a polymer (C1) or a monomer (C2), and the polymer (C1) may be the resin (A).;COPYRIGHT KIPO 2018
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