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LiCoO2 LiCoO2 SPUTTERING TARGET PRODUCTION METHOD THEREFOR AND POSITIVE ELECTRODE MATERIAL THIN FILM

机译：LiCoO2 LiCoO2溅射靶的制备方法及其正极和薄膜材料的制作

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摘要

A sputtering target made of a composition of LiCoO _2, and the resistivity of the target less than 100 Ω㎝, LiCoO ₂ sputtering target, characterized in that the relative density is 80% or more. INDUSTRIAL APPLICABILITY The sputtering target of the present invention is useful for the formation of a positive electrode thin film in a high-tension thin-film lithium ion secondary battery for use in automobiles, information communication appliances, home appliances and the like.

机译：由LiCoO _{2 组成的溅射靶，靶的电阻率小于100Ω㎝，LiCoO _{2 溅射靶，其相对密度为80 ％或者更多。工业上的可利用性本发明的溅射靶可用于在汽车，信息通信机器，家电机器等中使用的高压薄膜锂离子二次电池中形成正极薄膜。}}

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公开/公告号KR20180081173A

专利类型
公开/公告日2018-07-13

原文格式PDF
申请/专利权人 제이엑스금속주식회사;
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申请/专利号KR20187019202
发明设计人 사토 가즈유키;
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申请日2015-03-10
分类号C23C14/34;C23C14/08;H01M10/0525;H01M10/0562;H01M4/04;H01M4/131;H01M4/525;
国家 KR
入库时间 2022-08-21 12:39:32

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