CHEMICAL VAPOR DEPOSITION REACTOR HAVING REFLECTIVE COATING LAYER FOR MANUFACTURING POLYSILICON COATED THEREON AND MANUFACTURING METHOD THEREOF

摘要

An objective of the present invention is to provide a chemical vapor deposition (CVD) reactor having a reflective coating layer for manufacturing polysilicon coated thereon, in order to reduce a loss of radiant heat generated from a high pressure filament when polysilicon is manufactured in a Siemens CVD method. According to one embodiment of the present invention, the CVD reactor having a reflective coating layer for manufacturing polysilicon coated thereon comprises a reflective coating film formed on the inner surface of the CVD reactor by dual or multiple layers to reflect heat radiated from a heated rod filament to the inside of a bell jar. The reflective coating film comprises a reflective coating layer formed towards the inner space of the bell jar and reflecting heat, and a buffer layer formed between the reflective coating layer and the inner surface of the bell jar.;COPYRIGHT KIPO 2018