METHOD FOR DEPOSITING OXIDE FILM BY THERMAL ALD AND PEALD

摘要

A method for depositing an oxide film on a substrate by thermal ALD and PEALD includes the following steps: providing the substrate in a reaction chamber; depositing a first oxide film on the substrate by the thermal ALD in the reaction chamber; and continuously depositing a second oxide film on the first oxide film by the PEALD in the reaction chamber without destroying a vacuum. Accordingly, the present invention can substantially deposit the oxide film with high quality without damaging a lower film due to plasma.;COPYRIGHT KIPO 2018