The present invention relates to a deposition apparatus based on a 4-division chamber, a deposition system based on a multi-division chamber, and a deposition method using the same. The deposition apparatus based on a 4-division chamber comprises a fourth chamber; a third chamber (130) having a transfer robot (130a) formed thereon; a first chamber (110); a second chamber (120); and a deposition apparatus main body (100a). An upper transfer robot may continuously perform multi-supply of a semiconductor substrate, such as a mask for deposition or a glass substrate, for each division chamber.
展开▼
