A pre-patterned lithography template, a method based on radiation patterning using the template, and a method for forming the template

摘要

The high etch contrast material provides a basis for using a pre-patterned template structure with periodic holes and a template hardmask with fillers in the holes. Wherein the template hard mask provides a basis for quickly obtaining a high resolution pattern induced by the template and a high etch contrast resist. A method of performing radiation lithography, e.g., extreme UV (EUV) radiation lithography, using the pre-patterned template is described. In addition, a method of forming the template will be described. A material for forming the template is disclosed.