首页> 外国专利> PERHYDROPOLYSILAZANE COMPOSITION CONTAINING SAME AND METHOD FOR FORMING SILICA FILM USING SAME

PERHYDROPOLYSILAZANE COMPOSITION CONTAINING SAME AND METHOD FOR FORMING SILICA FILM USING SAME

机译:包含相同的全环硅氮烷组合物和使用该组合物形成二氧化硅膜的方法

摘要

[PROBLEMS] To provide a perhydro polysilazane capable of forming a siliceous film having few defects and a curing composition containing the same.[Solution] According to the present invention, there is provided a perhydropolysilazane having a weight average molecular weight of 5,000 or more and 17,000 or less, wherein the solution of the 17% by weight solution of the perhydropolysilazane in xylolOneAs a result of 1 H-NMR measurement, SiH 4 based on the amount of aromatic ring hydrogen in xylol1, 2Of 0.235 or less and the amount ratio of NH 3 is 0.055 or less, and a curing composition comprising the same. The present invention also provides a method for forming a silica-containing film by applying the composition for curing and heating the composition.
机译:[问题]为了提供一种能够形成缺陷少的硅质膜的全氢聚硅氮烷以及包含该全氢聚硅氮烷的固化组合物。[解决方案]根据本发明,提供了一种重均分子量为5,000以上的全氢聚硅氮烷。 17,000以下,其中17重量%的全氢聚硅氮烷在二甲苯酚中的溶液 1 1 H-NMR测定的结果,基于二甲苯酚中的芳香环氢的量的SiH 4 < 0.235以下的Sub> 1、2 ,且NH 3的量比为0.055以下,以及包含该固化剂的组合物。本发明还提供了通过施加用于固化和加热组合物的组合物来形成含二氧化硅的膜的方法。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号