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首页> 外文期刊>Key Engineering Materials >Preparation and Characterization of Silica Film on PBT Substrate by Sol-Gel Method Using Perhydropolysilazane
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Preparation and Characterization of Silica Film on PBT Substrate by Sol-Gel Method Using Perhydropolysilazane

机译:全氢聚硅氮烷溶胶凝胶法制备PBT衬底二氧化硅膜及其表征

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摘要

Silica, silica/polymethylmethacrylate (PMMA) hybrid, and silica-particle blend silica films were successfully prepared on polybutylene terephtalate (PBT) substrate by dip coating using perhydropolysilazane (PHPS) as a silica source. The effect of thermal treatment on conversion from PHPS to silica was investigated in detail by scanning electron microscopy and Fourier transform infrared spectroscopy. Mechanical properties of silica and silica/PMMA hybrid thin films also were examined by the pencil scratch hardness tests.
机译:通过使用全氢聚硅氮烷(PHPS)作为二氧化硅源的浸涂法,成功地在聚对苯二甲酸丁二醇酯(PBT)基底上制备了二氧化硅,二氧化硅/聚甲基丙烯酸甲酯(PMMA)杂化物和二氧化硅颗粒共混二氧化硅薄膜。通过扫描电子显微镜和傅里叶变换红外光谱详细研究了热处理对从PHPS转化为二氧化硅的影响。还通过铅笔划痕硬度测试检查了二氧化硅和二氧化硅/ PMMA杂化薄膜的机械性能。

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  • 来源
    《Key Engineering Materials》 |2010年第2010期|161-164|共4页
  • 作者单位

    Faculty of Engineering, University of Fukui, 9-1 Bunkyo 3-chome, Fukui-shi, Fukui 910-8507, Japan;

    Faculty of Engineering, University of Fukui, 9-1 Bunkyo 3-chome, Fukui-shi, Fukui 910-8507, Japan;

    Shimomura Shikkitcn, Co., Ltd, 8-7 Katayama-cho, Shabae-shi, Fukui 916-1223, Japan;

    Shimomura Shikkitcn, Co., Ltd, 8-7 Katayama-cho, Shabae-shi, Fukui 916-1223, Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    polysilazane; dip-coating; silica thin film;

    机译:聚硅氮烷浸涂二氧化硅薄膜;

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