首页> 外国专利> PERHYDROPOLYSILAZANE, COMPOSITION CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM USING SAME

PERHYDROPOLYSILAZANE, COMPOSITION CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM USING SAME

机译:全羟基硅氮烷,包含相同组分的组合物以及使用该组分形成二氧化硅膜的方法

摘要

[Problem] To provide a perhydropolysilazane making it possible to form a siliceous film with minimal defects, and a curing composition comprising the perhydropolysilazane. [Means for Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5,000 to 17,000, characterized in that when 1 H-NMR of a 17% by weight solution of said perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH 1,2 based on the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH based on the aromatic ring hydrogen content of the xylol is 0.055 or less, and a curing composition comprising the perhydropolysilazane. The present invention also provides a method for forming a siliceous film, comprising coating the curing composition on a substrate and heating.
机译:[问题]为了提供全氢聚硅氮烷,使得可以形成缺陷最少的硅质膜,以及包含该全氢聚硅氮烷的固化组合物。 [溶液的手段]本发明提供重均分子量为5,000至17,000的全氢聚硅氮烷,其特征在于,当测量所述17%重量的所述全氢聚硅氮烷溶解在二甲苯酚中的溶液的1 H-NMR时,相对于二甲苯酚的芳环氢含量,SiH 1,2的量为0.235以下,基于二甲苯酚的芳族环氢含量的NH的量的比例为0.055以下,包含全氢聚硅氮烷。本发明还提供了一种形成硅质膜的方法,该方法包括将固化组合物涂覆在基材上并加热。

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