An electrolyte composition containing strontium and silicon in a plasma electrolytic oxidation process and a method for manufacturing dental implants coated by hydroxyapatite containing strontium and silicon ions using the composition

摘要

The present invention relates to an electrolyte composition containing strontium and silicon in a plasma electrolytic oxidation process, and a method for manufacturing a dental implant coated with hydroxyapatite containing strontium and silicon ions by using the composition. According to an embodiment of the present invention, the electrolyte composition containing strontium and the silicon in a plasma electrolytic oxidation process comprises: calcium acetate monohydrate; calcium glycerophosphate; strontium acetate; sodium metasilicate nonahydrate; and distilled water. The electrolyte composition containing strontium and silicon in a plasma electrolytic oxidation process, and the method for manufacturing a dental implant coated with hydroxyapatite containing strontium and silicon ions by using the composition of the present invention can reduce a treatment period.