首页> 外国专利> An electrolyte composition containing magnesium and silicon in a plasma electrolytic oxidation process and a method for manufacturing dental implants coated by hydroxyapatite containing magnesium and silicon ions using the composition

An electrolyte composition containing magnesium and silicon in a plasma electrolytic oxidation process and a method for manufacturing dental implants coated by hydroxyapatite containing magnesium and silicon ions using the composition

机译:等离子体电解氧化工艺中含有镁和硅的电解质组合物,以及使用该组合物制造由含有镁和硅离子的羟基磷灰石涂覆的牙科植入物的方法

摘要

The present invention relates to a method for manufacturing implants, which uses an electrolyte solution containing magnesium and silicon to form the surface of a porous oxidation film containing magnesium, silicon ions, calcium and phosphorus on the surface of the dental implants through a plasma electrolytic oxidation method, thereby improving bioactivity, wherein the method comprises the following steps: a titanium alloy preparation step; an input step; a plasma forming step; and a drying step.
机译:植入物的制造方法技术领域本发明涉及一种植入物的制造方法,该方法使用包含镁和硅的电解质溶液通过等离子体电解氧化在牙齿植入物的表面上形成包含镁,硅离子,钙和磷的多孔氧化膜的表面。所述方法,从而提高生物活性,其中所述方法包括以下步骤:钛合金制备步骤;输入步骤;等离子体形成步骤;和干燥步骤。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号