Method of fabricating high quality black phosphorous thin film by the treatment of oxide-layer removal and reactive oxygen reaction

摘要

The present invention relates to a method for producing a black thin film and a black thin film produced therefrom. More particularly, the present invention relates to a method for producing a black thin film by forming a black ultra thin film by using active oxygen in a chamber, . More specifically, the black ultra thin film of the present invention can have high applicability to optoelectronic devices and field effect transistors by virtue of having a substantially flat, flat surface with a surface area roughness of 1 nm or less in a large area.;