A MODEL FOR AN APPARATUS OF CLUSTERED PHOTOLITHOGRAPHY FOR ACHIEVING FABWAFER FABRICATION FACILITIES-LEVEL SIMULATION AND A METHOD FOR SIMULATING USING IT

摘要

An object of the present invention is to provide a simulation apparatus of a wafer fabrication process level including a photolithography cluster apparatus capable of providing accurate prediction and optimized fabrication process and time reduction, and a simulation method using the same. The simulation apparatus according to an embodiment of the present invention comprises: an apparatus model determination unit for determining an apparatus model for a photolithography cluster apparatus simulation; a parameter calculation unit for calculating a parameter corresponding to the determined model; and a process simulation unit for driving the simulated photolithography cluster apparatus using the calculated parameters. The present invention provides photolithography cluster apparatus simulation of a wafer fabrication process (FAB) level.