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Multi-Zone Active-Matrix Temperature Control System and Temperature Control Method and Electrostatic Chuck and Plasma Processing Apparatus apply thereof

机译:多区域有源矩阵温度控制系统及其温度控制方法,静电吸盘和等离子体处理装置的应用

摘要

The present invention is a multi-zone active matrix temperature control system, wherein the temperature control system includes a temperature control matrix and a gate driver, the temperature control matrix comprising: N * M temperature control modules formed by a matrix of N rows and M columns, a power supply line, a power return line; Each temperature control module includes the following; A gate electrode connected to the gate driver; a semiconductor switch connected between both ends of the gate to the power supply return line through the power supply line and the temperature control unit and turned on and off; In the temperature control matrix, the temperature control unit of the temperature control module in the same row or same column is connected in series with one end of the power return line and at the same time with the power return line. The semiconductor switch of the temperature control module of the same row or the same column is connected in series with the power supply line at one end of the power supply line. The present invention can accurately control the temperature of each zone of the electrostatic chuck, thereby greatly reducing the number of lines drawn out of the electrostatic chuck.
机译:本发明是一种多区域有源矩阵温度控制系统,其中,该温度控制系统包括温度控制矩阵和栅极驱动器,该温度控制矩阵包括:N * M个温度控制模块,由N行和M个矩阵形成列,电源线,电源返回线;每个温度控制模块包括以下内容:栅极连接到栅极驱动器;半导体开关,其在栅极的两端之间通过电源线和温度控制单元连接到电源返回线,并且被接通和断开。在温度控制矩阵中,在同一行或同一列中的温度控制模块的温度控制单元与电源返回线的一端串联,同时与电源返回线串联。同一行或同一列的温度控制模块的半导体开关在电源线的一端与电源线串联连接。本发明可以精确地控制静电吸盘的每个区域的温度,从而大大减少了从静电吸盘引出的线的数量。

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