Cleaning liquid for wafer chuck table and chemical cleaning method of wafer chuck table using the same

摘要

The present invention relates to a cleaning liquid for a wafer chuck table and a chemical cleaning method for a wafer chuck table using the same. The present invention relates to a cleaning liquid for a wafer chuck table capable of nondestructively and effectively removing contaminants deposited on a wafer chuck surface in a semiconductor manufacturing process, and a chemical cleaning method of a wafer chuck table using the same. The cleaning liquid for the wafer chuck table comprises: 0.2-0.8 parts by weight of ammonium hydrogen fluoride; and 9.2-9.8 parts by weight of deionized water.