METHOD FOR SURFACE PLANIZING OF NANOSTRUCTURES OF MATERIALS OF ELECTRONIC EQUIPMENT BY A BEAM OF GAS CLUSTER IONS

摘要

FIELD: chemistry.SUBSTANCE: invention can be used for planarising nanostructure surfaces of materials. Essence of the invention lies in the fact that the method of planarising the surface of nanostructures of electronic materials is carried out with a cluster of gas cluster ions, and working gas of cluster gas ion beam is xenon.EFFECT: technical result is enabling reduction of surface roughness by approximately 2 times.1 cl, 1 tbl