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A MEANS TO DECOUPLE THE DIFFUSION AND SOLUBILITY SWITCH MECHANISMS OF PHOTORESISTS
A MEANS TO DECOUPLE THE DIFFUSION AND SOLUBILITY SWITCH MECHANISMS OF PHOTORESISTS
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机译:减少光致抗蚀剂扩散和溶解度转换机制的手段
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摘要
Embodiments of the invention include photoresist materials and methods of patterning photoresist materials. In an embodiment a photoresist material comprises a plurality of molecular glasses (MGs). In an embodiment, a glass transition temperature Tg of the photoresist material is less than an activation temperature needed to deblock blocking groups from the MGs. Embodiments include a method of patterning a photoresist material that comprises exposing the photoresist material with ultraviolet radiation. The method may also comprise, performing a first post exposure bake at a first temperature, that is less than the activation temperature needed to deblock blocking groups from the MGs, and performing a second post exposure bake at a second temperature that is approximately equal to or greater than the activation temperature needed to deblock blocking groups from the MGs.
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