首页> 外国专利> DIE FOR GROWING SINGLE CRYSTAL BY EFG METHOD, METHOD FOR GROWING SINGLE CRYSTAL BY EFG METHOD AND SINGLE CRYSTAL GROWN BY EFG METHOD

DIE FOR GROWING SINGLE CRYSTAL BY EFG METHOD, METHOD FOR GROWING SINGLE CRYSTAL BY EFG METHOD AND SINGLE CRYSTAL GROWN BY EFG METHOD

机译:EFG法生长单晶的模具,EFG法生长单晶的方法和EFG法生长单晶的方法

摘要

To improve the uniformity of impurity concentration of a grown single crystal.SOLUTION: A die 1 for growing a single crystal by an EFG method comprises: a lower surface 2 immersed in a raw material melt 12 having added impurities; a rectangular upper surface 5 facing a seed crystal 15 and having a long side 3 and a short side 4; and a plurality of slit parts 6 extended from the lower surface 2 to the upper surface 5 and raising a raw material melt 12 from the lower surface 2 to the upper surface 5. Since the longitudinal directions 7l of the openings 7 on the upper surface 5 of the plurality of slit parts 6 are parallel to each other and are not parallel to the long side 3 of the upper surface 5, an interval δ between the openings 7 of the slit parts 6 adjacent to each other is shorter than when the longitudinal directions 7l of the openings 7 on the upper surface 5 of the slit parts 6 are parallel to the long side 3 of the upper surface 5 in the total area of the openings 7 of the slit parts 6. Since segregation of impurities between the slit parts 6 hardly occurs, the uniformity of impurity concentration of a grown single crystal 14 can be improved.SELECTED DRAWING: Figure 2
机译:解决方案:用于通过EFG方法生长单晶的模具1包括:下表面2,其浸入具有添加的杂质的原料熔体12中;以及在下表面2中浸入有杂质的原料熔体中。矩形的上表面5面对种晶15,并具有长边3和短边4;多个狭缝部分6从下表面2延伸到上表面5,并且使原料熔体12从下表面2上升到上表面5。由于开口7在上表面5上的纵向7l多个狭缝部分6中的多个狭缝部分6彼此平行且不平行于上表面5的长边3,彼此相邻的狭缝部分6的开口7之间的间隔δ比纵向时短。狭缝部分6的上表面5上的开口7l在狭缝部分6的开口7的总面积上与上表面5的长边3平行。由于杂质在狭缝部分6之间的偏析几乎不会发生,可以提高生长的单晶14的杂质浓度的均匀性。图2

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