To provide a suitable toroidal plasma processing device.SOLUTION: A plasma processing device includes a vacuum chamber having a conduit, a process chamber, a first gas input port for introducing a gas into the vacuum chamber, and a pump port for evacuating gas from the vacuum chamber. A magnetic core surrounds the conduit. An RF power supply output is electrically connected to a magnetic core. An RF power supply source excites the magnetic core, thereby forming a toroidal plasma loop discharge in the vacuum chamber. A mounting plate, which supports a workpiece during plasma processing, is positioned in the process chamber.SELECTED DRAWING: Figure 2
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