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Laser facet passivation and system for performing such passivation

机译:激光刻面钝化以及执行这种钝化的系统

摘要

A method of passivating at least one facet of a multilayer waveguide structure comprises the steps of cleaning a first facet of the multilayer waveguide structure in a first chamber of a multi-chamber ultra high vacuum (UHV) system; Moving the cleaned multilayer waveguide structure from the first chamber to the second chamber of the multi-chamber UHV system, and forming a first single crystal passivation layer on the first facet in the second chamber And moving the multilayer waveguide structure from the second chamber to the third chamber of the multi-chamber UHV system, and forming a first dielectric on the first single crystal passivation layer in the third chamber. Forming a coating, and the method comprises applying a multilayer waveguide structure in a UHV environment of a multi-chamber UHV system. It is carried out without removal from the UHV environment.
机译:一种钝化多层波导结构的至少一个小面的方法,包括以下步骤:在多室超高真空(UHV)系统的第一腔室中清洁多层波导结构的第一小面;将清洁后的多层波导结构从多腔室特高压系统的第一腔室移至第二腔室,并在第二腔室的第一面上形成第一单晶钝化层,并将多层波导结构从第二腔室移至第二腔室。多室UHV系统的第三室,并在第三室中的第一单晶钝化层上形成第一电介质。形成涂层,并且该方法包括在多室UHV系统的UHV环境中施加多层波导结构。无需从特高压环境中移出即可执行。

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