To enable the state of an electrolytic plating solution to be analyzed with high accuracy without being affected by a difference in measurement environment.SOLUTION: While applying a voltage between a reference electrode and a working electrode to cause metal in an electrolytic plating solution to precipitate on the working electrode, an amount of electricity c1 is computed on the basis of a current value measured in a first measurement process for measuring the current value of a current flowing between a counter electrode and the working electrode and a duration of time for which the current was flowing between the counter electrode and the working electrode in the first measurement process. While applying a voltage between the reference electrode and the working electrode to cause the metal precipitated on the working electrode in the first measurement process to elute into the electrolytic plating solution, an amount of electricity c2 is computed on the basis of a current value measured in a second measurement process for measuring the current value of a current flowing between the counter electrode and the working electrode and a duration of time for which the current was flowing between the counter electrode and the working electrode in the second measurement process. Then, analysis is performed on the basis of a ratio of electricity amount between the amount of electricity c1 and the amount of electricity c2.SELECTED DRAWING: Figure 3
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