Pretreatment composition for electroless plating, pretreatment method for electroless plating, electroless plating method

摘要

The present invention is able to exhibit high plating deposition without using harmful chromic acid and expensive palladium, and can reduce the number of processes, a composition for electroless plating pretreatment, A processing method and an electroless plating method are provided. The present invention provides a composition for pretreatment of electroless plating comprising manganese ions of 10 mg / L or more and monovalent silver ions of 10 mg / L or more.