An a kind of thin skin for manufacturing for a lithographic apparatus, the method for a thin skin are used for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, the device for handling a thin skin and a kind of method for handling a thin skin

摘要

Manufacture membrane structure lithographic equipment is disclosed. In one arrangement, this method includes on the plane surface for deposit at least one layer of graphene layer substrate. The substrate includes the first base part and the second base part. This method further include: by the first base portion to form free-standing diaphragm from least one graphene layer. Self-supporting film is by the second base material part.