VANADIUM SILICIDE CARBIDE NITRIDE FILM, MEMBER COVERING VANADIUM SILICIDE CARBIDE NITRIDE FILM AND METHOD FOR MANUFACTURING THE SAME

摘要

To provide a hard film including vanadium, carbon and nitrogen and capable of improving hardness.SOLUTION: Formed is a vanadium silicide carbide nitride film 4 satisfying a relationship of 0.30≤a/b≤1.3 and 0.30≤a+b≤0.70 when defining vanadium element concentration/(vanadium element concentration+silicon element concentration+carbon element concentration+nitrogen element concentration) as a and silicon element concentration/(vanadium element concentration+silicon element concentration+carbon element concentration+nitrogen element concentration) as b in the film including vanadium, silicon, carbon and nitrogen and having 90 at% or more of the total amount of vanadium element concentration, silicon element concentration, carbon element concentration and nitrogen element concentration in the film. Preferably, the carbon element concentration is 10 at% or more and the nitrogen element concentration is 10 at% or more.SELECTED DRAWING: Figure 2