首页> 外国专利> COPPER-CERAMIC SUBSTRATE, COPPER PRECURSOR FOR PRODUCING A COPPER-CERAMIC SUBSTRATE AND PROCESS FOR PRODUCING A COPPER-CERAMIC SUBSTRATE

COPPER-CERAMIC SUBSTRATE, COPPER PRECURSOR FOR PRODUCING A COPPER-CERAMIC SUBSTRATE AND PROCESS FOR PRODUCING A COPPER-CERAMIC SUBSTRATE

机译:铜陶瓷基体,用于制造铜陶瓷基体的铜前驱体以及用于制造铜陶瓷基体的方法

摘要

The present invention relates to a copper-ceramic substrate (1) comprising - a ceramic support (2) and - a copper layer (3, 4) joined to a surface of the ceramic support (2), where - the copper layer (3, 4) has at least one first layer (5, 6) which faces the ceramic support and has an averaged first particle size, and a second layer (7, 8) disposed on the side of the copper layer (3, 4) that faces away from the ceramic support (2), and having an averaged second particle size, where - the second particle size is smaller than the first particle size. The first layer (5, 6) has on average a particle size of greater than 100 μm, preferably about 250 to 1000 μm, and - the second layer (7, 8) has on average a particle size of less than 100 μm, preferably about 50 μm, or - the first layer (5, 6) has on average a particle size of greater than 150 pm, preferably about 250 to 2000 μm, and the - second layer (7, 8) has on average a particle size of less than 150 pm, preferably about 50 pm. Preference is given to using Cu-ETP and Cu-OF or Cu-OFE.
机译:铜陶瓷基板(1)技术领域本发明涉及一种铜陶瓷基板(1),该铜陶瓷基板(1)具有-陶瓷支撑体(2)和-与该陶瓷支撑体(2)的表面接合的铜层(3、4),- ,(4)具有至少一个面对陶瓷载体并具有平均第一粒径的第一层(5、6),以及设置在铜层(3、4)一侧的第二层(7、8),背对陶瓷载体(2)并且具有平均的第二粒径,其中-第二粒径小于第一粒径。第一层(5、6)的平均粒径大于100μm,优选约250至1000μm,-第二层(7、8)的平均粒径小于100μm,优选-第一层(5、6)的平均粒径大于150μm,优选约250-2000μm,-第二层(7、8)的平均粒径为150μm。小于150 pm,最好约50 pm。优选使用Cu-ETP和Cu-OF或Cu-OFE。

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